Full field EUV lithography turning into a reality at IMEC

Author(s):

R. Jonckheere ( IMEC (Belgium) )

G. F. Lorusso ( IMEC (Belgium) )

A. M. Goethals ( IMEC (Belgium) )

J. Hermans ( IMEC (Belgium) )

B. Baudemprez ( IMEC (Belgium) )

A. Myers ( IMEC (Belgium) )

I. Kim ( IMEC (Belgium) )

A. Niroomand ( IMEC (Belgium) )

F. Iwamoto ( IMEC (Belgium) )

N. Stepanenko ( IMEC (Belgium) )

K. Ronse ( IMEC (Belgium) )

6 more

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings