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Improvement of etching selectivity for 32-nm node mask making

Author(s):
C. L. Lu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
L. Y. Hsia ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
T. H. Cheng ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
S. C. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
W. C. Wang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
H. J. Lee ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Y. C. Ku ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
2 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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