1-nm of local CD accuracy for 45nm-node photomask with low-sensitivity CAR for e-beam writer

1-nm of local CD accuracy for 45nm-node photomask with low-sensitivity CAR for e-beam writer

Author(s):

K. Ugajin ( Toshiba Corp. (Japan) )

M. Saito ( Toshiba Corp. (Japan) )

M. Suenaga ( Toshiba Corp. (Japan) )

T. Higaki ( Toshiba Corp. (Japan) )

H. Nishino ( Toshiba Corp. (Japan) )

H. Watanabe ( Toshiba Corp. (Japan) )

O. Ikenaga ( Toshiba Corp. (Japan) )

2 more

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings

Details

TDL ID:	ZA00046914
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2007 : 14th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2007.04.17-2007.04.19

Similar Items:

1 Conference Proceedings Higher current density operation with EB reticle writer EBM-5000 [6283-16] Saito, M., Ugajin, K., Hikagi, T., Nishino, H., Wanatabe, H. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Advantages of using the CAR for photomask manufacturing Kondoh,T., Itoh,M., Taniguchi,R., Ohtsubo,K., Sakai,M., Watanabe,H. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Electron-beam mask writer EBM-6000 for 45 nm HP node J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication Watanabe,H., Nakayama,Y., Tsuboi,S., Ezaki,M., Aoyama,H., Matsui,Y., Morosawa,T., Oda,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings EBM-5000: electron-beam mask writer for 45 nm node [6283-04] Sunaoshi, H., Tachikawa, Y., Higurashi, H., Iijima, T., Suzuki, J., Kamikubo, T., Ohtoshi, K., Anze, H., Katsumata, T., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Mask enhancer technology for 45-nm node contact hole fabrication Yuito, T., Wiaux, V., Look, L. Van, Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Watanabe, H., Sasago, M. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node Nkano, H., Nohda, S., Oguni, K., Motohashi, T., Yoshizawa, M., Kitagawa, T., Moriya, S. SPIE-The International Society for Optical Engineering	10 Conference Proceedings MoSi absorber photomask for 32nm node T. Konishi, Y. Kojima, H. Takahashi, M. Tanabe, T. Haraguchi Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Photomask repeater strategy for high-quality and low-cost reticle fabrication Kyoh, S., Inoue, S., Ikenaga, O., Higaki, T., Shigemitsu, F., Mori, I., Kokubo, H., Hayashi, N., Irie, N., Ishii, Y., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Photomask quality assessment solution for 90-nm technology node Ohira, K., Chung, D.H.P., Nobuyuki, Y., Tateno, M., Matsumura, K., Chen, J.-H., Luk-Pat, G.T., Fukui, N., Tanaka, Y. SPIE - The International Society of Optical Engineering
6 Conference Proceedings CD metrology for the 45-nm and 32-nm nodes Rice, B.J., Cao, H.B., Chaudhuri, O., Grumski, M.G., Harteneck, B.D., Liddle, A., Olynick, D., Roberts, J.M. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Photomask CD metrology at the 100-nm node Allsop, J., Johnson, S., Demarteau, M., Wismans, O. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12