Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition

Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition

Author(s):

J. Choi ( Samsung Electronics Co., Ltd. (South Korea) )

H. Lee ( Samsung Electronics Co., Ltd. (South Korea) )

J. Jung ( Samsung Electronics Co., Ltd. (South Korea) )

B. C. Cha ( Samsung Electronics Co., Ltd. (South Korea) )

S. -G. Woo ( Samsung Electronics Co., Ltd. (South Korea) )

H. Cho ( Samsung Electronics Co., Ltd. (South Korea) )

1 more

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings

Details

TDL ID:	ZA00046914
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2007 : 14th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2007.04.17-2007.04.19

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