Nanoscale relief on quartz: from phase masks to antireflection structures

Author(s):

• V. N. Petryakov ( Institute of Applied Physics (Russia)) )
• A. Y. Klimov ( Institute of Applied Physics (Russia)) )
• B. A. Gribkov ( Institute of Applied Physics (Russia)) )
• S. M. Olaizola ( CEIT and Tecnun, Univ. of Navarra (Spain) )
• Y. K. Verevkin ( Institute of Applied Physics (Russia) )

Publication title:

Photonic materials, devices, and applications II : 2-4 May 2007, Maspalomas, Gran Canaria, Spain

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6593

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467218 [0819467219]

Language:

English

Call no.:

P63600/6593

Type:

Conference Proceedings