Blank Cover Image

Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes

Author(s):
J. C. L. denmat ( STMicroelectronics (France) )
S. Manakli ( STMicroelectronics (France) )
B. Icard ( CEA Leti - MINATEC (France) )
C. Soonekindt ( NXP Semiconductors (France) )
B. Minghetti ( STMicroelectronics (France) )
O. L. borgne ( STMicroelectronics (France) )
L. Pain ( CEA Leti - MINATEC (France) )
2 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings E-beam lithography experimental results and simulation for the 45-nm node

Nistler, J., Chen, C. -J., Vychub, S., Lee, H. -C., Yeh, L. -C., Hsieh, H. -C., Sambale, C., Hofmann, U.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Electron-beam mask writer EBM-6000 for 45 nm HP node

J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Magic: a European program to push the insertion of maskless lithography

L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Study of mask structure for 45-nm node based on manufacturability and lithographic performance

J. G. Doh, C. H. Park, Y. S. Moon, B. H. Kim, S. W. Kwon, S. Y. Choi, S. H. Kim, S. Y. Kim, B. G. Kim, S. G. Woo, H. K. …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Application of vector scan electron-beam lithography to 45-nm node extreme-ultraviolet lithography reticles

Walker, D.M., Mathur, D.P., Su, C., Huang, T.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Evaluation of ArF lithography for 45-nm node implant layers

T. C. Bailey, J. Maynollo, J. J. Perez, I. Popova, B. Zhang

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Simulation of the 45-nm half-pitch node with 193-nm immersion lithography

Biswas, A.M., Frauenglass, A., Brueck, S.R.J.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings OPC optimization for double dipole lithography and its application on 45nm node with dry exposure

S.-J. Park, J.-K.Seo, C. Li, D. Liu, P. An

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Implementation of double dipole lithography for 45-nm node poly and diffusion layer manufacturing with 0.93NA

M. -H. Wu, M. Hsu, S. Hsu, B. -J. Lu, Y. -F. Cheng, Y. -L. Chou, C. -H. Yang

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Reflection control for immersion lithography at 45/32-nm nodes

W.-J. Tseng, R.-H. Hsu, S. H. Hou, T.-H. Tseng, B. Lin

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings E-beam direct-write lithography for the 45-nm node using the novel STEAG HamaTech single substrate coat-bake-develop ModuTrack

Egbert, A., Becker, S., Chichkov, B. N.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 100-nm node lithography with KrF?

Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12