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Quantitative measurement of EUV resist outgassing

Author(s):
G. Denbeaux ( Univ. at Albany (USA) )
R. Garg ( Univ. at Albany (USA) )
J. Waterman ( Univ. at Albany (USA) )
C. Mbanaso ( Univ. at Albany (USA) )
J. Netten ( Univ. at Albany (USA) )
R. Brainard ( Univ. at Albany (USA) )
Y. Fan ( Univ. at Albany (USA) )
L. Yankulin ( Univ. at Albany (USA) )
A. Antohe ( Univ. at Albany (USA) )
K. DeMarco ( Univ. at Albany (USA) )
M. Jaffe ( Univ. at Albany (USA) )
M. Waldron ( Univ. at Albany (USA) )
K. Dean ( SEMATECH, Inc. (USA) )
8 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

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