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Calibration of CD mask standards for the 65-nm node: CoG and MoSi

Author(s):
J. Richter ( Advanced Mask Technology Ctr. (Germany) )
T. Heins ( Advanced Mask Technology Ctr. (Germany) )
R. Liebe ( Advanced Mask Technology Ctr. (Germany) )
B. Bodermann ( Physikalisch-Technische Bundesanstalt (Germany) )
A. Diener ( Physikalisch-Technische Bundesanstalt (Germany) )
D. Bergmann ( Physikalisch-Technische Bundesanstalt (Germany) )
C. G. Frase ( Physikalisch-Technische Bundesanstalt (Germany) )
H. Bosse ( Physikalisch-Technische Bundesanstalt (Germany) )
3 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

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