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The effect of intra-field CD uniformity control (CDC) on mask birefringence

Author(s):
G. Ben-Zvi ( Pixer Technology Ltd. (Israel) )
E. Zait ( Pixer Technology Ltd. (Israel) )
V. Krugliakov ( Pixer Technology Ltd. (Israel) )
V. Dmitriev ( Pixer Technology Ltd. (Israel) )
G. Gottlieb ( Pixer Technology Ltd. (Israel) )
S. Oshemkov ( Pixer Technology Ltd. (Israel) )
1 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

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