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Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Author(s):
R. Eklund ( Micronic Laser Systems AB (Sweden) )
A. Oesterberg ( Micronic Laser Systems AB (Sweden) )
J. Hellgren ( Micronic Laser Systems AB (Sweden) )
H. Fosshaug ( Micronic Laser Systems AB (Sweden) )
T. Karlin ( Micronic Laser Systems AB (Sweden) )
T. Newman ( Micronic Laser Systems AB (Sweden) )
1 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

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