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Programmed defects study on masks for 45nm immersion lithography using the novel AIMS 45-193i

Author(s):
T. Scheruebl ( Carl Zeiss SMS GmbH (Germany) )
A. C. Duerr ( Advanced Mask Technology Ctr. GmbH and Co. (Germany) )
K. Boehm ( Carl Zeiss SMS GmbH (Germany) )
R. Birkner ( Carl Zeiss SMS GmbH (Germany) )
R. Richter ( Carl Zeiss SMS GmbH (Germany) )
U. Stroessner ( Carl Zeiss SMS GmbH (Germany) )
1 more
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

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