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Minimizing poly end cap pull back by application of DFM and advanced etch approaches for 65nm and 45nm technologies

Author(s):
R. Callahan ( AMD Saxony Manufacturing GmbH (Germany) )
G. Grasshoff ( AMD Saxony Manufacturing GmbH (Germany) )
S. Roling ( AMD Saxony Manufacturing GmbH (Germany) )
J. Shannon ( Advanced Micro Devices (USA) )
A. Nomura ( AMD Saxony Manufacturing GmbH (Germany) )
S. N. McGowan ( Advanced Micro Devices (USA) )
C. E. Tabery ( Advanced Micro Devices (USA) )
K. Romero ( AMD Saxony Manufacturing GmbH (Germany) )
3 more
Publication title:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
Language:
English
Call no.:
P63600/6521
Type:
Conference Proceedings

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