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Double pattern EDA solutions for 32nm HP and beyond

Author(s):
G. E. Bailey ( Mentor Graphics Corp. (USA) )
A. Tritchkov ( Mentor Graphics Corp. (USA) )
J. Park ( Mentor Graphics Corp. (USA) )
L. Hong ( Mentor Graphics Corp. (USA) )
V. Wiaux ( IMEC (Belgium) )
E. Hendrickx ( IMEC (Belgium) )
S. Verhaegen ( IMEC (Belgium) )
P. Xie ( Mentor Graphics Corp. (USA) )
J. Versluijs ( IMEC (Belgium) )
4 more
Publication title:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
Language:
English
Call no.:
P63600/6521
Type:
Conference Proceedings

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