Blank Cover Image

Pattern decomposition for double patterning from photomask viewpoint

Author(s):
N. Toyama ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Adachi ( Dai Nippon Printing Co., Ltd. (Japan) )
Y. Inazuki ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Sutou ( Dai Nippon Printing Co., Ltd. (Japan) )
Y. Morikawa ( Dai Nippon Printing Co., Ltd. (Japan) )
H. Mohri ( Dai Nippon Printing Co., Ltd. (Japan) )
N. Hayashi ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
Language:
English
Call no.:
P63600/6521
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Approach to analyze decomposition impact for photomask fabrication

N. Toyama, T. Adachi, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
7 Conference Proceedings In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]

Morikawa, Y., Sutou, T., Inazuki, Y., Adachi, T., Yoshida, Y., Kojima, K., Sasaki, S., Mohri, H., Hayashi, N., Dmitriev, …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings 45-32-nm node photomask technology with water immersion lithography [6349-134]

Adachi, T., Inazuki, Y., Sutou, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Analysis of diffraction orders including mask topography effects for OPC optimization

Y. Inazuki, N. Toyama, T. Adachi, T. Nagai, T. Suto, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability

Y. Inazuki, N. Toyama, T. Nagai, T. Sutou, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Estimating DPL photomask fabrication load compared with single exposure

N. Toyama, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Extendibility of single mask exposure for practical ArF immersion lithography

T. Adachi, Y. Inazuki, T. Sutou, T. Nagai, N. Toyama, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Characteristics optimization of mask materials for hyper-NA lithography

Y. Morikawa, T. Suto, T. Nagai, Y. Inazuki, T. Adachi, Y. Kitahata, T. Yokoyama, N. Toyama, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Lithographic performance comparison with various RET for 45-nm node with hyper NA [6283-67]

Adachi,T., Inazuki, Y., Sutou, T., Kitahata, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings DPL performance analysis strategy with conventional workflow

N. Toyama, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Pupil plane analysis on AIMS 45-193i for advanced photomasks

Y. Morikawa, T. Sutou, K. Mesuda, T. Nagai, Y. Inazuki, T. Adachi, N. Toyama, H. Mohri, N. Hayashi, U. Stroessner, R. …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Mask CD compensation method using diffraction intensity for lithography equivalent metrology

T. Nagai, T. Sutou, Y. Inazuki, H. Hashimoto, N. Toyama

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12