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Patterning effect and correlated electrical model of post-OPC MOSFET devices

Author(s):
Y. C. Cheng ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
T. H. Ou ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
M. H. Wu ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
W. L. Wang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
J. H. Feng ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
W. C. Huang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
C. M. Lai ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
R. G. Liu ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
Y. C. Ku ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
4 more
Publication title:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
Language:
English
Call no.:
P63600/6521
Type:
Conference Proceedings

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