Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window

Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window

Author(s):

M. Saied ( Freescale Semiconductor (France) )

F. Foussadier ( STMicroelectronics (France) )

J. Belledent ( NXP Semiconductors (France) )

Y. Trouiller ( CEA-LETI (France) )

I. Schanen ( IMEP (France) )

C. Gardin ( Freescale Semiconductor (France) )

J. C. Urbani ( STMicroelectronics (France) )

P. K. Montgomery ( Freescale Semiconductor (France) )

F. Sundermann ( STMicroelectronics (France) )

F. Robert ( STMicroelectronics (France) )

C. Couderc ( NXP Semiconductors (France) )

F. Vautrin ( STMicroelectronics (France) )

G. Kerrien ( STMicroelectronics (France) )

J. Planchot ( STMicroelectronics (France) )

E. Yesilada ( Freescale Semiconductor (France) )

C. Martinelli ( STMicroelectronics (France) )

B. Wilkinson ( Freescale Semiconductor (France) )

A. Borjon ( NXP Semiconductors (France) )

L. Le-Cam ( NXP Semiconductors (France) )

J. L. Di-Maria ( CEA-LETI (France) )

Y. Rody ( NXP Semiconductors (France) )

N. Morgana ( Photronics, Inc. (USA) )

V. Farys ( STMicroelectronics (France) )

18 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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