Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window
- Author(s):
M. Saied ( Freescale Semiconductor (France) ) F. Foussadier ( STMicroelectronics (France) ) J. Belledent ( NXP Semiconductors (France) ) Y. Trouiller ( CEA-LETI (France) ) I. Schanen ( IMEP (France) ) C. Gardin ( Freescale Semiconductor (France) ) J. C. Urbani ( STMicroelectronics (France) ) P. K. Montgomery ( Freescale Semiconductor (France) ) F. Sundermann ( STMicroelectronics (France) ) F. Robert ( STMicroelectronics (France) ) C. Couderc ( NXP Semiconductors (France) ) F. Vautrin ( STMicroelectronics (France) ) G. Kerrien ( STMicroelectronics (France) ) J. Planchot ( STMicroelectronics (France) ) E. Yesilada ( Freescale Semiconductor (France) ) C. Martinelli ( STMicroelectronics (France) ) B. Wilkinson ( Freescale Semiconductor (France) ) A. Borjon ( NXP Semiconductors (France) ) L. Le-Cam ( NXP Semiconductors (France) ) J. L. Di-Maria ( CEA-LETI (France) ) Y. Rody ( NXP Semiconductors (France) ) N. Morgana ( Photronics, Inc. (USA) ) V. Farys ( STMicroelectronics (France) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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