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Feasibility study of 45nm metal patterning with 0.93 NA

Author(s):
  • Y. F. Cheng ( United Microelectronics Corp. (Taiwan) )
  • Y. L. Chou ( United Microelectronics Corp. (Taiwan) )
  • Y. C. Hou ( United Microelectronics Corp. (Taiwan) )
  • B. J. Lu ( United Microelectronics Corp. (Taiwan) )
  • C. H. Yang ( United Microelectronics Corp. (Taiwan) )
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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