Comparing traditional OPC to field-based OPC for 45-nm node production

Comparing traditional OPC to field-based OPC for 45-nm node production

Author(s):

R. Farnbach ( Synopsys, Inc. (USA) )

J. Tuttle ( Synopsys, Inc. (USA) )

M. S. John ( Synopsys, Inc. (USA) )

R. Brown ( Synopsys, Inc. (USA) )

D. Gerold ( Synopsys, Inc. (USA) )

K. Lucas ( Synopsys, Inc. (USA) )

R. Lugg ( Synopsys, Inc. (USA) )

J. Shiely ( Synopsys, Inc. (USA) )

M. Rieger ( Synopsys, Inc. (USA) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

Similar Items:

1 Conference Proceedings A new methodology for quantifying OPC recipe accuracy [5992-180] Ziger, D., Gerold, D., King, C., Amoroso, F., Tuttle, J., Lugg, R. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Functionality and performance improvements with field-based OPC B. Painter, K. Taravade, L. Barnes, R. Lugg, J. Mayhew, G. Newell, K. Lucas SPIE - The International Society of Optical Engineering	8 Conference Proceedings Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Adaptive OPC with a conformal target layout Lugg, R.M., Beale, D.F., Huang, J., Rieger, M.L. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Enriching design intent for optimal OPC and RET Rieger, M.L., Gravoulet, V., Mayhew, J.P., Beale, D.F., Lugg, R.M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Model-based OPC for first-generation 193-nm lithography Lucas,K.D., Word,J.C., Vandenberghe,G.N., Verhaegen,S., Jonckheere,R.M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Reticle enhancement verification for the 65nm and 45nm nodes [6156-58] Lucas, K., Patterson, K., Boone, R., Miramond, C., Borjon, A., Belledent, J., Toublan, O., Entradas, J., Trouiller, Y. SPIE - The International Society of Optical Engineering
5 Conference Proceedings High transmission mask technology for 45nm node imaging [6154-38] Conley, W., Morgana, N., Kasprowicz, B. S., Cangemi, M., Lassiter, M., Litt, L. C., Cottle, R., Wu, W., Cobb, J., Ham, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Effective distributed architecture for OPC and RET applications Lugg, R.M., Boman, M., Burdorf, J., Rieger, M.L. SPIE-The International Society for Optical Engineering
6 Conference Proceedings High transmission mask technology for 45nm node imaging [6154-50] Conley, W., Morgana, N., Kasprowicz B S, Cangemi M, Lassiter M, Litt L C, Cangemin M, Cottle R, Wu W, Cobb J, Ham Y M, … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12