Blank Cover Image

Improving the model robustness for OPC by extracting relevant test patterns for calibration

Author(s):
M. Jeong ( Samsung Electronics Co., Ltd. (South Korea) )
S. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
J. Jung ( Samsung Electronics Co., Ltd. (South Korea) )
C. Hyon ( Samsung Electronics Co., Ltd. (South Korea) )
I. Choi ( Samsung Electronics Co., Ltd. (South Korea) )
Y. Kang ( Samsung Electronics Co., Ltd. (South Korea) )
Y. Park ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Merged contact OPC using pattern type specific modeling and correction

S. Suh, S. Kim, S. Lee, Y. Kim, J. Lee, C. Kang

SPIE - The International Society of Optical Engineering
2 Conference Proceedings SEM contour-based model OPC calibrated with optically sensitive patterns

J.-E. Jung, M.-K. Lee, Y.-J. Cho, S.-H. Lee, Y.-S. Kang

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Maximizing test pattern coverage for OPC model build [6154-123]

Khoh, A., Quek, S. F., Foong, Y. M., Cheng, J., Choi, B. -I.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Efficient approach to improving pattern fidelity with multi-OPC model and recipe [6349-182]

Do, M., Kang, J., Choi, J., Lee, J., Lee, Y., Kim, K., Dongbu Electronics (South Korea)

SPIE - The International Society of Optical Engineering
9 Conference Proceedings OPC accuracy and process window verification methodology for sub-100-nm node

Yang, H., Park, C., Hong, J., Jeong, G., Cho, B., Choi, J., Kang, C., Yang, K., Kang, E., Ji, S., Yim, D., Song, Y.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Effect of lens aberrations on OPC model accuracy for low kl lithography process [6154-116]

Ahn J. K, Jeong C. Y, Park J.-L, Choi J.-S, Lee J.-G

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Feedback flow to improve model-based OPC calibration test patterns

W. A. Tawfic, M. Al-Imam, K. Madkour, R. Fathy, I. Kusnadi, G. E. Bailey

SPIE - The International Society of Optical Engineering
5 Conference Proceedings OPC model calibration for CPL patterning at extreme low k1

Shi, X., Laidig, T., Chen, J. F., Van Den Broeke, D., Hsu, S., Hsu, M., Wampler, K. E., Hollerbach, U., Park, J. C., Yu, …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow

J. H. Kang, J.-Y. Choi, Y.-A. Shim, H.-S. Lee, B. Su

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Y. Kim, I. Kim, J. Park, S. Kim, S. Suh, Y. Cheon, S. Lee, J. Lee, C. Kang, J. Moon, J. Cobb

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I., Park, E.-S., Lee, J.-H., Jeong, W.-G., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12