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Advanced new OPC method to improve OPC accuracy for sub-90nm technology

Author(s):
J. Choi ( Dongbu Electronics Co., Ltd. (South Korea) )
J. Kang ( Dongbu Electronics Co., Ltd. (South Korea) )
Y. Shim ( Dongbu Electronics Co., Ltd. (South Korea) )
K. Yun ( Dongbu Electronics Co., Ltd. (South Korea) )
J. Hong ( Dongbu Electronics Co., Ltd. (South Korea) )
Y. Lee ( Dongbu Electronics Co., Ltd. (South Korea) )
K. Kim ( Dongbu Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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