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Mask enhancement using an evanescent wave effect

Author(s):
  • N. V. Lafferty ( Rochester Institute of Technology (USA) )
  • J. Zhou ( Rochester Institute of Technology (USA) )
  • B. W. Smith ( Rochester Institute of Technology (USA) )
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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