Golden curve method for OPC signature stability control in high MEEF applications
- Author(s):
K. Geidel ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) ) T. Franke ( Qimonda AG (Germany) ) S. Roling ( AMD Fab 36 LLC and Co. KG (Germany) ) P. Buck ( Toppan Photomasks, Inc. (USA) ) M. Sczyrba ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) ) E. Mittermeier ( Qimonda AG (Germany) ) R. Cinque ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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