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Effects of laser bandwidth on iso-dense bias and line end shortening at sub-micron process nodes

Author(s):
R. C. Peng ( TSMC Corp. (Taiwan) )
A. K. Yang ( TSMC Corp. (Taiwan) )
L. J. Chen ( TSMC Corp. (Taiwan) )
Y. W. Guo ( TSMC Corp. (Taiwan) )
H. H. Liu ( TSMC Corp. (Taiwan) )
J. Lin ( TSMC Corp. (Taiwan) )
A. Chang ( Cymer, Inc. (Taiwan) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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