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The calibration of process window model for 55-nm node

Author(s):
T. H. Wu ( United Microelectronics Corp. (Taiwan) )
S. Y. Huang ( United Microelectronics Corp. (Taiwan) )
C. W. Huang ( United Microelectronics Corp. (Taiwan) )
P. R. Tsai ( United Microelectronics Corp. (Taiwan) )
C. H. Yang ( United Microelectronics Corp. (Taiwan) )
I. Y. Su ( Synopsys, Inc. (Taiwan) )
B. Falch ( Synopsys, Inc. (USA) )
2 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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