Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Author(s):

H. Watanabe ( Gigaphoton Inc. (Japan) )

S. Komae ( Gigaphoton Inc. (Japan) )

S. Tanaka ( Ushio Inc. (Japan) )

R. Nohdomi ( Gigaphoton Inc. (Japan) )

T. Yamazaki ( Gigaphoton Inc. (Japan) )

H. Nakarai ( Gigaphoton Inc. (Japan) )

J. Fujimoto ( Gigaphoton Inc. (Japan) )

T. Matsunaga ( Komatsu Ltd. (Japan) )

T. Saito ( Gigaphoton inc. (Japan) )

K. Kakizaki ( Ushio Inc. (Japan) )

H. Mizoguchi ( Gigaphoton Inc. (Japan) )

6 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings