Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ= 193nm

Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ= 193nm

Author(s):

G. Capetti ( STMicroelectronics (Italy) )

P. Cantu ( STMicroelectronics (Italy) )

E. Galassini ( STMicroelectronics (Italy) )

A. V. Pret ( STMicroelectronics (Italy) )

C. Turco ( STMicroelectronics (Italy) )

A. Vaccaro ( STMicroelectronics (Italy) )

P. Rigolli ( STMicroelectronics (Italy) )

F. D'Angelo ( STMicroelectronics (Italy) )

G. Cotti ( STMicroelectronics (Italy) )

4 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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