Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography
- Author(s):
H. J. Liu ( Nanya Technology Corp. (Taiwan) ) W. H. Hsieh ( Nanya Technology Corp. (Taiwan) ) C. H. Yeh ( Nanya Technology Corp. (Taiwan) ) J. S. Wu ( Nanya Technology Corp. (Taiwan) ) H. W. Chan ( Nanya Technology Corp. (Taiwan) ) W. B. Wu ( Nanya Technology Corp. (Taiwan) ) F. Y. Chen ( Nanya Technology Corp. (Taiwan) ) T. Y. Huang ( Nanya Technology Corp. (Taiwan) ) C. L. Shih ( Nanya Technology Corp. (Taiwan) ) J. P. Lin ( Nanya Technology Corp. (Taiwan) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Study of dry etching pattern profile of chromeless phase lithography (CPL) mask
SPIE - The International Society of Optical Engineering |
MRS - Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ= 193nm
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Dual-layer inorganic SiON bottom ARC for 0.25-μm DUV hard mask applications
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Pattern transfer at k1=0.5:get 0.25-ヲフm lithography ready for manufacturing
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Effect of Boron on the Corrosion Properties of Al0.5CoCrCuFeNiBx High Entropy Alloys in 1N Sulfuric Acid
Electrochemical Society |
6
Conference Proceedings
Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ-193nm
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Global CD uniformity improvement in mask manufacturing for advanced lithography
SPIE - The International Society of Optical Engineering |