A litho-only approach to double patterning
- Author(s):
- A. Vanleenhove ( NXP Semiconductors (Belgium) )
- D. V. Steenwinckel ( NXP Semiconductors (Belgium) )
- Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Phase-only projection-slice filters for invariant optical pattern recognition
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Enhanced processing: sub-50 nm features with 0.8-μm DOF using a binary reticle
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Topological and model based approach to pitch decomposition for double patterning
Society of Photo-optical Instrumentation Engineers |