Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology
- Author(s):
- C. Sarma ( Infineon Technologies NA (USA) )
- K. Herold ( Infineon Technologies NA (USA) )
- C. Noelscher ( Qimonda Dresden GmbH & Co OHG (Germany) )
- P. Schroeder ( Infineon Technologies NA (USA) )
- Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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