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Process window optimization of CPL mask for beyond 45nm lithography

Author(s):
  • S. Y. Tan ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Q. Lin ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • C. J. Tay ( National Univ. of Singapore (Singapore) )
  • C. Quan ( National Univ. of Singapore (Singapore) )
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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