Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Author(s):

T. Suzuki ( Komatsu Ltd. (Japan) )

K. Kakizaki ( Ushio Inc. (Japan) )

T. Matsunaga ( Komatsu Ltd. (Japan) )

S. Tanaka ( Ushio Inc. (Japan) )

Y. Kawasuji ( Komatsu Ltd. (Japan) )

M. Shimbori ( Ushio Inc. (Japan) )

M. Yoshino ( Ushio Inc. (Japan) )

T. Kumazaki ( Komatsu Ltd. (Japan) )

H. Umeda ( Komatsu Ltd. (Japan) )

H. Nagano ( Ushio Inc. (Japan) )

S. Nagai ( Komatsu Ltd. (Japan) )

Y. Sasaki ( Ushio Inc. (Japan) )

H. Mizoguchi ( Gigaphoton Inc. (Japan) )

8 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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