XLR 500i: recirculating ring ArF light source for immersion lithography
- Author(s):
D. W. Brown ( Cymer Inc. (USA) ) P. O'Keeffe ( Cymer Inc. (USA) ) V. B. Fleurov ( Cymer Inc. (USA) ) R. Rokitski ( Cymer Inc. (USA) ) R. Bergstedt ( Cymer Inc. (USA) ) I. V. Fomenkov ( Cymer Inc. (USA) ) K. O'Brien ( Cymer Inc. (USA) ) N. R. Farrar ( Cymer Inc. (USA) ) W. N. Partlo ( Cymer Inc. (USA) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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