Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Author(s):

Y. Sekine ( Canon Inc. (Japan) )

M. Kawashima ( Canon Inc. (Japan) )

E. Sakamoto ( Canon Inc. (Japan) )

K. Sakai ( Canon Inc. (Japan) )

A. Yamada ( Canon Inc. (Japan) )

T. Honda ( Canon Inc. (Japan) )

1 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

Similar Items:

1 Conference Proceedings ArF immersion lithography: critical optical issues Honda, T., Kishikawa, Y., Tokita, T., Ohsawa, H., Kawashima, M., Ohkubo, A., Yoshii, M., Uda, K., Suzuki, A. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Immersion exposure system using high-index materials K. Sakai, Y. Iwasaki, S. Mori, A. Yamada, M. Ogusu Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings High-refractive index material design for ArF immersion lithography T. Furukawa, T. Kishida, T. Miyamatsu, K. Kawaguchi, K. Yamada, T. Tominaga, M. Slezak, K. Hieda SPIE - The International Society of Optical Engineering	8 Conference Proceedings High refractive index materials design for the next generation ArF immersion lithography T. Furukawa, T. Kishida, K. Yasuda, T. Shimokawa, Z. Liu Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Analysis of imaging properties for hyper-NA ArF immersion lithography Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings High-index resist for 193-nm immersion lithography K. Matsumoto, E. Costner, I. Nishimura, M. Ueda, C. G. Willson Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches R. H. French, V. Liberman, H. V. Tran, J. Feldman, D. J. Adelman, R. C. Wheland, W. Qiu, S. J. McLain, O. Nagao, M. … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Study on imaging characterization of ArF high index immersion lithography S. Park, J.-T. Park, K. Lee, T.-S. Eom, J.-S. Kim Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches R. H. French, H. V. Tran, D. J. Adelman, N. S. Rogado, M. Kaku Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Simulation of the 45-nm half-pitch node with 193-nm immersion lithography Biswas, A.M., Frauenglass, A., Brueck, S.R.J. SPIE - The International Society of Optical Engineering
6 Conference Proceedings ArF Immersion Lithography for 45nm and beyond A. Yamada SPIE - The International Society of Optical Engineering	12 Conference Proceedings High-refractive-index fluids for the next-generation ArF immersion lighography [6153-10] Wang, Y, Miyamatsu, T, Furukawa, T, Yamada, K, Tominaga, T, Makita, Y, Nakagawa, H, Nakamura, A, Shima, M, Kusumoto, S, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12