Extending immersion lithography with high-index materials: results of a feasibility study

Extending immersion lithography with high-index materials: results of a feasibility study

Author(s):

H. Sewell ( ASML US, Inc. (USA) )

J. Mulkens ( ASML Netherlands B.V. (Netherlands) )

P. Graeupner ( Zeiss SMT (Germany) )

D. McCafferty ( ASML US, Inc. (USA) )

L. Markoya ( ASML US, Inc. (USA) )

S. Donders ( ASML Netherlands B.V. (Netherlands) )

N. Samarakone ( ASML US, Inc. (USA) )

R. Duesing ( Zeiss SMT AG (Germany) )

3 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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