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Pupil plane analysis on AIMS 45-193i for advanced photomasks

Author(s):
Y. Morikawa ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Sutou ( Dai Nippon Printing Co., Ltd. (Japan) )
K. Mesuda ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Nagai ( Dai Nippon Printing Co., Ltd. (Japan) )
Y. Inazuki ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Adachi ( Dai Nippon Printing Co., Ltd. (Japan) )
N. Toyama ( Dai Nippon Printing Co., Ltd. (Japan) )
H. Mohri ( Dai Nippon Printing Co., Ltd. (Japan) )
N. Hayashi ( Dai Nippon Printing Co., Ltd. (Japan) )
U. Stroessner ( Carl Zeiss SMS GmbH (Germany) )
R. Birkner ( Carl Zeiss SMS GmbH (Germany) )
R. Richter ( Carl Zeiss SMS GmbH (Germany) )
T. Scheruebl ( Carl Zeiss SMS GmbH (Germany) )
8 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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