Contamination and particle control system in immersion exposure tool

Author(s):

M. Kobayashi ( Canon Inc. (Japan) )

H. Nakano ( Canon Inc. (Japan) )

M. Arakawa ( Canon Inc. (Japan) )

M. Tanabe ( Canon Inc. (Japan) )

K. Toyoda ( Canon Inc. (Japan) )

T. Chibana ( Canon Inc. (Japan) )

Y. Matsuoka ( Canon Inc. (Japan) )

Y. Kawasaki ( Canon Inc. (Japan) )

3 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings