Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's

Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's

Author(s):

A. E. Rosenbluth ( IBM T.J. Watson Research Ctr. (USA) )

D. Melville ( IBM T.J. Watson Research Ctr. (USA) )

K. Tian ( IBM Semiconductor Research and Development Ctr. (USA) )

K. Lai ( IBM Semiconductor Research and Development Ctr. (USA) )

N. Seong ( IBM Semiconductor Research and Development Ctr. (USA) )

D. Pfeiffer ( IBM T.J. Watson Research Ctr. (USA) )

M. Colburn ( IBM T.J. Watson Research Ctr. (USA) )

2 more

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings

Details

TDL ID:	ZA00046827
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2007 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.02

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