Control of polarization and apodization with film materials on photomasks and pellicles for high NA imaging performance

Author(s):

• W. Cheng ( Intel Corp. (USA) )
• J. Farnsworth ( Intel Corp. (USA) )

Publication title:

Optical microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6520

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

Language:

English

Call no.:

P63600/6520

Type:

Conference Proceedings