Polarization-dependent proximity effects
- Author(s):
- J. K. Tyminski ( Nikon Precision Inc. (USA) )
- T. Matsuyama ( Nikon Corp. (Japan) )
- T. Nakashima ( Nikon Corp. (Japan) )
- T. Schmoeller ( Synopsys Inc. (Germany) )
- J. Lewellen ( Synopsys Inc. (USA) )
- Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Resist profile control in immersion lithography using scatterometry measurements
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
10
Conference Proceedings
Characteristics analysis of polarization module on optical proximity effect
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Three dimensional mask effects in OPC process model development from first principles simulation
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |