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Modeling polarization for hyper-NA lithography tools and masks

Author(s):
K. Lai ( IBM SRDC (USA) )
A. E. Rosenbluth ( IBM T. J. Watson Research Ctr. (USA) )
G. Han ( IBM SRDC (USA) )
J. Tirapu-Azpiroz ( IBM SRDC (USA) )
J. Meiring ( IBM SRDC (USA) )
A. Goehnermeier ( Carl Zeiss SMT, AG (Germany) )
B. Kneer ( Carl Zeiss SMT, AG (Germany) )
M. Totzeck ( Carl Zeiss SMT, AG (Germany) )
L. de Winter ( ASML Netherlands B.V. (Netherlands) )
W. de Boeij ( ASML Netherlands B.V. (Netherlands) )
M. van de Kerkhof ( ASML Netherlands B.V. (Netherlands) )
6 more
Publication title:
Optical microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6520
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
Language:
English
Call no.:
P63600/6520
Type:
Conference Proceedings

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