Phenolic molecular glasses as resists for next-generation lithography

Author(s):

X. Andre ( Cornell Univ. (USA) )

J. K. Lee ( Cornell Univ. (USA) )

A. D. Silva ( Cornell Univ. (USA) )

N. Felix ( Cornell Univ. (USA) )

C. K. Ober ( Cornell Univ. (USA) )

H. B. Cao ( Intel Corp. (USA) )

H. Deng ( Intel Corp. (USA) )

H. Kudo ( Kanagawa Univ. (Japan) )

D. Watanabe ( Kanagawa Univ. (Japan) )

T. Nishikubo ( Kanagawa Univ. (Japan) )

5 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings