Some non-resist component contributions to LER and LWR in 193-nm lithography
- Author(s):
T. Kudo ( AZ Electronic Materials USA Corp. (USA) ) S. Chakrapani ( AZ Electronic Materials USA Corp. (USA) ) G. Lin ( AZ Electronic Materials USA Corp. (USA) ) C. Anyadiegwu ( AZ Electronic Materials USA Corp. (USA) ) C. Antonio ( AZ Electronic Materials USA Corp. (USA) ) D. Parthasarathy ( AZ Electronic Materials USA Corp. (USA) ) R. R. Dammel ( AZ Electronic Materials USA Corp. (USA) ) M. Padmanaban ( AZ Electronic Materials USA Corp. (USA) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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