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Distribution control of protecting groups and its effect on LER for EUV molecular resist

Author(s):
D. Shiono ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
H. Hada ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
H. Yukawa ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
H. Oizumi ( ASET NTT (Japan) )
I. Nishiyama ( ASET NTT (Japan) )
K. Kojima ( Hitachi, Ltd. (Japan) )
H. Fukuda ( Hitachi, Ltd. (Japan) )
2 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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