Blank Cover Image

Effect of novel rinsing material and surfactant treatment on the resist pattern performance

Author(s):
V. Huang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. C. Chiu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. A. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
C. Y. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
T. S. Gau ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
B. J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
1 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Pattern-dependence optical phase effect on alternating phase shift mask

Chang, B.-C., You, J.-W., Lu, M., Lee, C.-L., Kung, L.-W., Shu, K.-C., Shin, J.-J., Gau, T.-S., Lin, B.J.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Influence of shot noise on CDU with DUV, EUV, and E-beam

Z.-Y. Pan, C.-K. Chen, T.-S. Gau, B. J. Lin

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Patterning fidelity on low-energy multiple-electron-beam direct write lithography

S. M. Chang, S. J. Lin, C. A. Lin, J. H. Chen, T. S. Gau

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Microlens-induced pattern defect in DUV resist

Tsai, S.-F., Chen, C.-Y., Chang, C.-C., Huang, T.-W., Gao, H.-Y., Ku, C.-Y.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Effect of various ArF resist shrinkage amplitudes on CD bias

Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

L. Shiu, F. Liang, H. Chang, C. Chen, L. Chen, T. Gau, B. J. Lin

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Alt- PSM of contact with phase-assist feature for 65-nm node

You, J.-W., Shin, J.-J., Chang, C.-H., Kung, L.-W., Chang, B.-C., Dai, C.-M., Gau, T.-S., Lin, B.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Chou, S.-Y., Shin, J.-J., Shu, K.-C., You, J.-W., Shiu, L.-H., Chang, B.-C., Gau, T.-S., Lin, B.J.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS

Chang, J.P., Sapjeta, J., Rosamilia, J.M., Boone, T., Eng, J., Jr., Opila, R.L., Brennan, S., Wiemer, C., Pianetta, P.

Electrochemical Society
6 Conference Proceedings OCD metrology by floating n/k

S. Yu, J. Huang, C. Ke, T. Gau, B. J. Lin, A. Yen, L. Lane, V. Vuong, Y. Chen

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

F. Liang, H. Chang, L. Shiu, C. Chen, L. Chen, T. Gau, B. J. Lin

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12