Development of high-performance multi-layer resist process with hardening treatment

Author(s):

Y. Ono ( Renesas Technology Corp. (Japan) )

T. Ishibashi ( Renesas Technology Corp. (Japan) )

A. Yamaguchi ( Renesas Technology Corp. (Japan) )

T. Hanawa ( Renesas Technology Corp. (Japan) )

M. Tadokoro ( Renesas Technology Corp. (Japan) )

K. Yoshikawa ( Renesas Technology Corp. (Japan) )

K. Yonekura ( Renesas Technology Corp. (Japan) )

K. Matsuda ( Toray Research Ctr. Inc. (Japan) )

T. Matsunobe ( Toray Research Ctr. Inc. (Japan) )

Y. Fujii ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )

T. Tanaka ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )

6 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings