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Initial process evaluation for next generation immersion technology node

Author(s):
T. Tomita ( Tokyo Electron Kyushu Ltd. (Japan) )
K. Nafus ( Tokyo Electron Kyushu Ltd. (Japan) )
S. Hatakeyama ( Tokyo Electron Kyushu Ltd. (Japan) )
H. Kosugi ( Tokyo Electron Kyushu Ltd. (Japan) )
M. Enomoto ( Tokyo Electron Kyushu Ltd. (Japan) )
S. Inoue ( Tokyo Electron Europe Ltd. (Germany) )
K. Ruck ( Tokyo Electron Europe Ltd. (Germany) )
H. Weichert ( Tokyo Electron Europe Ltd. (Germany) )
M. B. Mantecon ( ASML Netherlands B.V. (Netherlands) )
R. Stegen ( ASML Netherlands B.V. (Netherlands) )
C. de Groot ( ASML Netherlands B.V. (Netherlands) )
R. Moerman ( ASML Netherlands B.V. (Netherlands) )
7 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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