Blank Cover Image

Defect transfer from immersion exposure process to post processing and defect reduction using novel immersion track system

Author(s):
O. Miyahara ( Tokyo Electron Kyushu Ltd. (Japan) )
T. Shimoaoki ( Tokyo Electron Kyushu Ltd. (Japan) )
S. Wakamizu ( Tokyo Electron Kyushu Ltd. (Japan) )
J. Kitano ( Tokyo Electron Kyushu Ltd. (Japan) )
Y. Ono ( Renesas Technology Corp. (Japan) )
S. Maejima ( Renesas Technology Corp. (Japan) )
T. Hanawa ( Renesas Technology Corp. (Japan) )
K. Suko ( Renesas Technology Corp. (Japan) )
3 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Studies on immersion defects using mimic immersion experiments [6153-61]

Hanawa, T, Suganaga, T, Ishibashi, T, Maejima, S, Narimatsu, K, Suko, K, Terai, M, Kumada, T, Kitano, J

SPIE - The International Society of Optical Engineering
7 Conference Proceedings A novel Alt-PSM structure: isnt this an embedded Atten-PSM? [6349-100]

Nakao, S., Hosono, K., Maejima, S., Narimatsu, K., Hanawa, T., Suko, K.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Defect transfer from immersion exposure process to etching process using novel immersion exposure and track system

O. Miyahara, H. Kosugi, S. Dunn, Y. van Dommelen, C. Grouwstra

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Defect analysis in 157-nm photolithography process

Hori, S., Miyahara, O., Kiba, Y., Ono, Y., Kitano, J., Miyoshi, S., Furukawa, T., Itani, T.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Adapting immersion exposure to mass production by adopting a cluster of novel resist-coating/developing and immersion-exposure equipment

T. Fujiwara, J. Ishikawa, T. Kawakubo, Y. Ishii, H. Kyoda, S. Wakamizu, T. Shimoaoki

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Mechanisms of defect generation in chemically amplified resist processes

Shimoaoki, T., Naito, R., Kitano, J.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings 193-nm immersion lithography for high volume manufacturing using novel immersion exposure tool and coater/developer system

S. Wakamizu, H. Kyouda, K. Nakano, T. Fujiwara

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Verification of optical proximity effect in immersion lithography [6154-176]

Suganaga T, Maejima S, Hanawa T, Ishibashi T, Nakao S, Shirai S, Narimatsu K, Suko K, Shiraishi K, Ishii Y, Ando, T, …

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Improvement of pattern collapse issue by additive-added D.I water rinse process: II

Miyahara, O., Tanaka, K., Wakamizu, S., Kitano, J., Yamada, Y.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Behavior of chemically amplified resist defects in TMAH solution

Ono, Y., Miyahara, O., Kiba, Y., Kitano, J.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Behavior of chemically amplified resist defects in TMAH solution: III

Ono, Y., Shimoaoki, T., Naito, R., Kitano, J.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs

S. Nakao, S. Maejima, T. Yamamoto, Y. Ono, J. Sakai, A. Yamaguchi, A. Imai, T. Hanawa, K. Sukoh

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12