Defectivity reduction studies for ArF immersion lithography

Author(s):

K. Matsunaga ( Toshiba Corp. (Japan) )

T. Kondoh ( Toshiba Corp. (Japan) )

H. Kato ( Toshiba Corp. (Japan) )

Y. Kobayashi ( Toshiba Corp. (Japan) )

K. Hayasaki ( Toshiba Corp. (Japan) )

S. Ito ( Toshiba Corp. (Japan) )

A. Yoshida ( SanDisk Corp. (Japan) )

S. Shimura ( Tokyo Electron Kyushu Ltd. (Japan) )

T. Kawasaki ( Tokyo Electron Kyushu Ltd. (Japan) )

H. Kyoda ( Tokyo Electron Kyushu Ltd. (Japan) )

5 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings