An analysis of EUV-resist outgassing measurements
- Author(s):
K. R. Dean ( SEMATECH, Inc. (USA) ) I. Nishiyama ( Association of Super-Advanced Electronics Technologies (Japan) ) H. Oizumi ( Association of Super-Advanced Electronics Technologies (Japan) ) A. Keen ( BOC Edwards, Inc. (USA) ) H. Cao ( Intel Corp. (USA) ) W. Yueh ( Intel Corp. (USA) ) T. Watanabe ( Univ. of Hyogo (Japan) ) P. Lacovig ( Sincrotrone Trieste S.c.p.A (Italy) ) L. Rumiz ( Sincrotrone Trieste S.c.p.A (Italy) ) G. Denbeaux ( SUNY, Univ. at Albany (USA) ) J. Simon ( CEA, LETI (France) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist
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