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An analysis of EUV-resist outgassing measurements

Author(s):
K. R. Dean ( SEMATECH, Inc. (USA) )
I. Nishiyama ( Association of Super-Advanced Electronics Technologies (Japan) )
H. Oizumi ( Association of Super-Advanced Electronics Technologies (Japan) )
A. Keen ( BOC Edwards, Inc. (USA) )
H. Cao ( Intel Corp. (USA) )
W. Yueh ( Intel Corp. (USA) )
T. Watanabe ( Univ. of Hyogo (Japan) )
P. Lacovig ( Sincrotrone Trieste S.c.p.A (Italy) )
L. Rumiz ( Sincrotrone Trieste S.c.p.A (Italy) )
G. Denbeaux ( SUNY, Univ. at Albany (USA) )
J. Simon ( CEA, LETI (France) )
6 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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