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Resist evaluation for EUV application at ASET

Author(s):
  • D. Goo ( Association of Super-Advanced Electronic Technologies (Japan) )
  • Y. Tanaka ( Association of Super-Advanced Electronic Technologies (Japan) )
  • Y. Kikuchi ( Association of Super-Advanced Electronic Technologies (Japan) )
  • H. Oizumi ( Association of Super-Advanced Electronic Technologies (Japan) )
  • I. Nishiyama ( Association of Super-Advanced Electronic Technologies (Japan) )
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

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